Title :
VLSI Technologies - A future perspective
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Keywords :
Circuits; Etching; Ion implantation; Lithography; Materials science and technology; Microelectronics; Semiconductor devices; Silicon; Temperature; Very large scale integration;
Conference_Titel :
Electron Devices Meeting, 1981 International
Conference_Location :
Washington, DC, USA
DOI :
10.1109/IEDM.1981.190169