Title :
Nitrided-oxides for thin gate dielectrics in MOS devices
Author :
Grinolds, H.R. ; Wong, S.S. ; Ekstedt, T.W. ; Sodini, C.G. ; Kwan, S.H. ; Jackson, K.H. ; Martinez, L.
Author_Institution :
Hewlett-Packard Laboratories, Palo Alto, CA
Keywords :
Dielectric devices; Dielectric materials; MOS devices; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Plasma sources; Plasma temperature; Semiconductor films;
Conference_Titel :
Electron Devices Meeting, 1982 International
DOI :
10.1109/IEDM.1982.190207
