DocumentCode :
3555738
Title :
A 1000V high voltage P-channel DSAMOS-IC
Author :
Nakagawa, K. ; Ashida, T. ; Takeuchi, H. ; Fujii, K.
Author_Institution :
Sharp Corporation, Tenri-City, Nara, Japan
Volume :
28
fYear :
1982
fDate :
1982
Firstpage :
72
Lastpage :
75
Abstract :
The object of this work is to develop a high voltage P-channel MOS IC for display driving. High voltage PMOS devices are suitable for current source drivers of plasma display, or vacuum fluorescent display. Low voltage circuits have been integrated with high voltage PMOS devices on a same chip. The high voltage PMOS transistor consists of lateral lightly doped drift region (P-) and a Diffusion-Self-Aligned (DSA) structure on a low impurity substrate (ν) and of multilayer field plates to ensure high reliability for the device. The device structure and process parameter are optimized by using process simulator "SUPREM II". The high voltage P-channel MO5 device provides 1000-V drain-breakdown voltage and can operate at 800-V drain-source voltage with 35mA drain current, on resistance as low as 1.5KΩ within an active area of 0.14mm2.
Keywords :
Degradation; Electrodes; Fabrication; Logic; Nonhomogeneous media; Oxidation; Silicon; Space vector pulse width modulation; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1982 International
Type :
conf
DOI :
10.1109/IEDM.1982.190215
Filename :
1482749
Link To Document :
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