DocumentCode :
3555782
Title :
Session 9 Device technology — MOS device isolation
Author :
Davies, R.D. ; Nishi, Yoshio
Author_Institution :
Texas Instruments, Inc., Dallas, TX, USA
fYear :
1982
fDate :
13-15 Dec. 1982
Firstpage :
215
Lastpage :
215
Abstract :
Start of the above-titled section of the conference proceedings.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1982 International
Conference_Location :
San Francisco, CA, USA
Type :
conf
DOI :
10.1109/IEDM.1982.190255
Filename :
1482789
Link To Document :
بازگشت