DocumentCode
3555840
Title
Multi-layer resist systems as a means to submicron optical lithography
Author
Lin, B.J.
Author_Institution
IBM Thomas J. Watson Research Center, Yorktown Heights, New York
Volume
28
fYear
1982
fDate
1982
Firstpage
391
Lastpage
394
Keywords
Control systems; Interference; Lithography; Optical imaging; Optical sensors; Particle beam optics; Phase change materials; Resists; Wet etching; X-ray imaging;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1982 International
Type
conf
DOI
10.1109/IEDM.1982.190306
Filename
1482840
Link To Document