DocumentCode :
3555864
Title :
Normally-off type high speed SI-Thyristor
Author :
Nakamura, Y. ; Tadano, H. ; Sugiyama, S. ; Igarashi, I. ; Ohmi, T. ; Nishizaw, J.
Author_Institution :
Toyota Central Research and Development Laboratories, Inc., Nagakute, Japan
Volume :
28
fYear :
1982
fDate :
1982
Firstpage :
480
Lastpage :
483
Abstract :
The design, fabrication, and characterization of a normally-off type static induction thyristor (SIThy) with a surface gate structure were made with an intention to use it in high speed switching at high currents. The device chip had a size of 7 × 10 mm2and included 9,000 channels, where each channel stripe had a width of 1.5 \\\\mu m and a length of 250 \\\\mu m. The double LOCOS technique was used in the fabrication process of the device. By mounting the chips in specially designed packages, a very low forward voltage drop of 1.2 V at 100 A and a high switching speed of 300 ∼ 600 nsec in turn-on and turn-off times were obtained. A bipolar mode static induction transistor (BSIT) was also made by using the same photomasks and the same fabrication process as SIThy. It also exhibited a low forward voltage drop of 0.7 V at 100 A and a high switching speed of 100 ∼ 200 nsec in turn-on and turn-off times.
Keywords :
Anodes; Cathodes; Fabrication; Impurities; Low voltage; Neodymium; Packaging; Power semiconductor switches; Surface resistance; Thyristors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1982 International
Type :
conf
DOI :
10.1109/IEDM.1982.190330
Filename :
1482864
Link To Document :
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