DocumentCode :
3555905
Title :
A new VLSI memory cell using capacitance coupling
Author :
Terada, K. ; Takada, M. ; Ishijima, T. ; Kurosawa, S. ; Suzuki, S.
Author_Institution :
Nippon Electric Co., Ltd., Kawasaki-city, Japan
Volume :
28
fYear :
1982
fDate :
1982
Firstpage :
624
Lastpage :
627
Abstract :
A new VLSI memory cell, which offers small cell area, about 6F2(where F is the feature size), internal cell gain and high alpha-particle immunity is proposed. Since it employs capacitance coupling in a write operation, it requires only one bit line and is called a Capacitance-Coupling (CC) cell. A CC cell consists of three transistors and a capacitor, which are integrated in a small area by sharing their nodes with one another. The charge is stored in a P+-type diffused layer in a shallow N-type diffused layer. The P+-layer potential controls the readout current which flows through the N-layer. Experimental test devices having a 0.7 \\\\mu m deep N-layer and 0.2 \\\\mu m deep P+-layer were fabricated. The complete CC cell operation was confirmed.
Keywords :
Capacitors; Coupling circuits; MOSFET circuits; Microelectronics; Parasitic capacitance; Testing; Threshold voltage; Very large scale integration; Voltage control; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1982 International
Type :
conf
DOI :
10.1109/IEDM.1982.190370
Filename :
1482904
Link To Document :
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