Quadruple-well CMOS - A VLSI technology

Author

Chen, J.Y.

Author_Institution

Hughes Research Laboratories, Malibu, CA, USA

fYear

1982

fDate

13-15 Dec. 1982

Firstpage

791

Lastpage

792

Keywords

Boron; CMOS process; CMOS technology; FETs; Implants; Ionizing radiation; Laboratories; Testing; Very large scale integration; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1982 International

Conference_Location

San Francisco, CA, USA

Type

DOI

10.1109/IEDM.1982.190415

Filename

1482949

Link To Document