• DocumentCode
    3555988
  • Title

    Optimum design of power MOSFETs

  • Author

    Hower, P.L. ; Heng, T.M.S. ; Huang, C.

  • Author_Institution
    Unitrode Corporation, Watertown, Mass.
  • Volume
    29
  • fYear
    1983
  • fDate
    1983
  • Firstpage
    87
  • Lastpage
    90
  • Abstract
    Three cell geometeries (rectangle, square and hexagon) have been investigated using a lumped Rdsmodel. It is demonstrated that for each geometry one can calculate a spacing of the p-well diffusions that minimizes Rds. This optimum spacing is a function of the vertical and lateral p-well dimensions, the desired breakdown voltage, and, in some cases, the average current density in the cell. It is shown that in choosing the minimum Rdsfor the typical range of breakdown voltages (50- 1000V) and realizable cell sizes (20 to 40 µm), the square gives a smaller Rdsthan the rectangle, and the hexagon gives a smaller resistance than the square. Therefore, the hexagon is the preferred geometry for these situations.
  • Keywords
    Conductivity; Contact resistance; Current density; Differential equations; Geometry; MOSFETs; Neck; Predictive models; Proximity effect;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1983 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1983.190447
  • Filename
    1483572