DocumentCode
3555988
Title
Optimum design of power MOSFETs
Author
Hower, P.L. ; Heng, T.M.S. ; Huang, C.
Author_Institution
Unitrode Corporation, Watertown, Mass.
Volume
29
fYear
1983
fDate
1983
Firstpage
87
Lastpage
90
Abstract
Three cell geometeries (rectangle, square and hexagon) have been investigated using a lumped Rds model. It is demonstrated that for each geometry one can calculate a spacing of the p-well diffusions that minimizes Rds . This optimum spacing is a function of the vertical and lateral p-well dimensions, the desired breakdown voltage, and, in some cases, the average current density in the cell. It is shown that in choosing the minimum Rds for the typical range of breakdown voltages (50- 1000V) and realizable cell sizes (20 to 40 µm), the square gives a smaller Rds than the rectangle, and the hexagon gives a smaller resistance than the square. Therefore, the hexagon is the preferred geometry for these situations.
Keywords
Conductivity; Contact resistance; Current density; Differential equations; Geometry; MOSFETs; Neck; Predictive models; Proximity effect;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1983 International
Type
conf
DOI
10.1109/IEDM.1983.190447
Filename
1483572
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