DocumentCode :
3556008
Title :
Resistanse modulation effect due to current injection and CMOS latch-up
Author :
Niitsu, Youichiro ; Nihira, Hiroyuki ; Kanzaki, Koichi ; Kohyama, Susumu
Author_Institution :
TOSHIBA Corporation, Kawasaki-city, Japan
Volume :
29
fYear :
1983
fDate :
1983
Firstpage :
164
Lastpage :
167
Abstract :
Latch-up in both n-well and p-well CMOS inverters has been measured and quantitatively analyzed. It was found that the resistance of substrate and well are modulated by minority carrier injection from emitters of the parasitic bipolar transistors, and measured values of latch-up critical triggering current and holding current are two or three times larger than the simply expected values. The latch-up analysis including the modulation effects should give useful information for opimizing well or substrate structure and concentration.
Keywords :
Bipolar transistors; CMOS technology; Current measurement; Electrical resistance measurement; Inverters; Laboratories; Semiconductor device measurement; Semiconductor devices; Substrates; Thyristors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1983 International
Type :
conf
DOI :
10.1109/IEDM.1983.190467
Filename :
1483592
Link To Document :
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