Title :
An integrated IC process characterization facility
Author :
Scharfetter, D.L. ; Tremain, R.E., Jr. ; Oki, T.J. ; Doganis, K. ; Chen, S.
Author_Institution :
Xerox Palo Alto Research Center, Palo Alto, Calif.
Abstract :
An IC process characterization facility has been established which is heavily based upon an integrated network environment (Ethernet). This environment represents an instance of what has been referred to as the "factory of the future." The extraction of device parameters suitable for circuit simulation is discussed as one function of such a facility.
Keywords :
Circuit simulation; Circuit testing; Databases; Ethernet networks; Libraries; Monitoring; Production facilities; System testing; Test facilities; Threshold voltage;
Conference_Titel :
Electron Devices Meeting, 1983 International
DOI :
10.1109/IEDM.1983.190487
