• DocumentCode
    3556028
  • Title

    An automated methodology for generating self-consistent layout rules for VLSI designs

  • Author

    Bayless, M. ; Devanney, W. ; Waller, W. ; Laurent, D.

  • Author_Institution
    Mostek Corporation, Carrollton, Texas
  • Volume
    29
  • fYear
    1983
  • fDate
    1983
  • Firstpage
    250
  • Lastpage
    254
  • Abstract
    A methodology for automatically generating self-consistent layout groundrules is presented. The methodology uses electrically measured data on misalignment tolerances and critical dimensions as inputs for the calculation of layout groundrules. Examples of layout groundrules constrained by electrical, lithographic or reliability reasons will be shown. Sample groundrules will be constructed using the different components that make up the groundrule. Critical dimension data and misalignment data will be shown that demonstrate common pitfalls in the measurement of the data. A computer program that calculates each groundrule is briefly described and is shown to have utility in being, able to quickly define a complete set of layout groundrules based on updated misalignment and critical dimension data. The end result of this methodology produces a set of self-consistent layout groundrules where no single layout rule will be more difficult to make than any other layout rules.
  • Keywords
    Circuits; Databases; Electric resistance; Electric variables measurement; Electrons; Etching; Random access memory; Resists; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1983 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1983.190488
  • Filename
    1483613