• DocumentCode
    3556063
  • Title

    Series resistance modeling for optimum design of LDD transistors

  • Author

    Duvvury, C. ; Baglee, D.A. ; Smayling, M.C. ; Duane, M.P.

  • Author_Institution
    Texas Instruments Inc., Houston, Tx
  • Volume
    29
  • fYear
    1983
  • fDate
    1983
  • Firstpage
    388
  • Lastpage
    391
  • Abstract
    The characteristics of lightly doped drain transistors are presented and compared with conventional devices. A technique for modeling these devices is then described. We show that LDD transistors have lower substrate currents resulting in improved reliability. The amount of the reduction depends on the the source/drain resistance, However we show that this resistance can have a large effect on circuit performance and that the trade off between circuit response and substrate currents must be carefully evaluated. This understanding allows us to fabricate circuits with a minimum number of process iterations.
  • Keywords
    Circuit optimization; Circuit testing; Data mining; Electrical resistance measurement; Etching; Fabrication; Implants; Substrates; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1983 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1983.190523
  • Filename
    1483648