DocumentCode :
3556063
Title :
Series resistance modeling for optimum design of LDD transistors
Author :
Duvvury, C. ; Baglee, D.A. ; Smayling, M.C. ; Duane, M.P.
Author_Institution :
Texas Instruments Inc., Houston, Tx
Volume :
29
fYear :
1983
fDate :
1983
Firstpage :
388
Lastpage :
391
Abstract :
The characteristics of lightly doped drain transistors are presented and compared with conventional devices. A technique for modeling these devices is then described. We show that LDD transistors have lower substrate currents resulting in improved reliability. The amount of the reduction depends on the the source/drain resistance, However we show that this resistance can have a large effect on circuit performance and that the trade off between circuit response and substrate currents must be carefully evaluated. This understanding allows us to fabricate circuits with a minimum number of process iterations.
Keywords :
Circuit optimization; Circuit testing; Data mining; Electrical resistance measurement; Etching; Fabrication; Implants; Substrates; Transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1983 International
Type :
conf
DOI :
10.1109/IEDM.1983.190523
Filename :
1483648
Link To Document :
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