DocumentCode
3556063
Title
Series resistance modeling for optimum design of LDD transistors
Author
Duvvury, C. ; Baglee, D.A. ; Smayling, M.C. ; Duane, M.P.
Author_Institution
Texas Instruments Inc., Houston, Tx
Volume
29
fYear
1983
fDate
1983
Firstpage
388
Lastpage
391
Abstract
The characteristics of lightly doped drain transistors are presented and compared with conventional devices. A technique for modeling these devices is then described. We show that LDD transistors have lower substrate currents resulting in improved reliability. The amount of the reduction depends on the the source/drain resistance, However we show that this resistance can have a large effect on circuit performance and that the trade off between circuit response and substrate currents must be carefully evaluated. This understanding allows us to fabricate circuits with a minimum number of process iterations.
Keywords
Circuit optimization; Circuit testing; Data mining; Electrical resistance measurement; Etching; Fabrication; Implants; Substrates; Transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1983 International
Type
conf
DOI
10.1109/IEDM.1983.190523
Filename
1483648
Link To Document