• DocumentCode
    3556067
  • Title

    Bipolar device scaling limits from tunneling in base-emitter junctions

  • Author

    Stork, J.M.C. ; Isaac, R.D.

  • Author_Institution
    IBM T. J. Watson Research Center, Yorktown Heights, NY, USA
  • Volume
    29
  • fYear
    1983
  • fDate
    1983
  • Firstpage
    404
  • Lastpage
    407
  • Abstract
    Substantial tunneling currents in emitter-base junctions at lower doping levels than previously expected (1) have been observed, and are shown to be the result of high electric fields in shallow, scaled n+-p junctions. The distinctive form of the reverse I-V curves is theoretically explained and verified by measurements on shallow n+-p diodes. The appearance of a tunneling current is ascertained by the temperature dependence, which also allows a clear distinction of other current mechanisms. It is shown how C-V data can be analyzed to obtain an experimental value for the maximum electric field in the junction, which is essential in predicting the I-V characteristics of scaled bipolar transistors.
  • Keywords
    Bipolar transistors; Boron; Capacitance-voltage characteristics; Data analysis; Diodes; Doping profiles; Impurities; Temperature dependence; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1983 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1983.190527
  • Filename
    1483652