DocumentCode
3556067
Title
Bipolar device scaling limits from tunneling in base-emitter junctions
Author
Stork, J.M.C. ; Isaac, R.D.
Author_Institution
IBM T. J. Watson Research Center, Yorktown Heights, NY, USA
Volume
29
fYear
1983
fDate
1983
Firstpage
404
Lastpage
407
Abstract
Substantial tunneling currents in emitter-base junctions at lower doping levels than previously expected (1) have been observed, and are shown to be the result of high electric fields in shallow, scaled n+-p junctions. The distinctive form of the reverse I-V curves is theoretically explained and verified by measurements on shallow n+-p diodes. The appearance of a tunneling current is ascertained by the temperature dependence, which also allows a clear distinction of other current mechanisms. It is shown how C-V data can be analyzed to obtain an experimental value for the maximum electric field in the junction, which is essential in predicting the I-V characteristics of scaled bipolar transistors.
Keywords
Bipolar transistors; Boron; Capacitance-voltage characteristics; Data analysis; Diodes; Doping profiles; Impurities; Temperature dependence; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1983 International
Type
conf
DOI
10.1109/IEDM.1983.190527
Filename
1483652
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