DocumentCode :
3556067
Title :
Bipolar device scaling limits from tunneling in base-emitter junctions
Author :
Stork, J.M.C. ; Isaac, R.D.
Author_Institution :
IBM T. J. Watson Research Center, Yorktown Heights, NY, USA
Volume :
29
fYear :
1983
fDate :
1983
Firstpage :
404
Lastpage :
407
Abstract :
Substantial tunneling currents in emitter-base junctions at lower doping levels than previously expected (1) have been observed, and are shown to be the result of high electric fields in shallow, scaled n+-p junctions. The distinctive form of the reverse I-V curves is theoretically explained and verified by measurements on shallow n+-p diodes. The appearance of a tunneling current is ascertained by the temperature dependence, which also allows a clear distinction of other current mechanisms. It is shown how C-V data can be analyzed to obtain an experimental value for the maximum electric field in the junction, which is essential in predicting the I-V characteristics of scaled bipolar transistors.
Keywords :
Bipolar transistors; Boron; Capacitance-voltage characteristics; Data analysis; Diodes; Doping profiles; Impurities; Temperature dependence; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1983 International
Type :
conf
DOI :
10.1109/IEDM.1983.190527
Filename :
1483652
Link To Document :
بازگشت