• DocumentCode
    3556114
  • Title

    High temperature and extended endurance characteristics of EEROM

  • Author

    Jenq, Ching S. ; Wong, Ting ; Joshi, Bharati ; Hu, Chenming

  • Author_Institution
    SEEQ Technology, Inc., San Jose, Ca
  • Volume
    29
  • fYear
    1983
  • fDate
    1983
  • Firstpage
    585
  • Lastpage
    588
  • Abstract
    This paper presents data resulting from an investigation on the endurance characteristics of EEROM cells at elevated temperatures, and on the possibility of extending the endurance of EEROM memory arrays to beyond the current spec of 10K cycles. It will first show that the intrinsic endurance limit of an oxynitride E2cell is higher at 125°C than at room temperature due to thermal detrapping of trapped electrons in the tunneling dielectric. The endurance of EEROM memory arrays will be shown to be limited by random defects. Data will be presented to demonstrate that by combining clean processing and proper screening, the endurance spec of EEROM memory arrays can be extended to beyond 100K cycles. It is projected that in the very near future the endurance spec of an EEROM memory array can reach the intrinsic endurance limit of singles E2cells, which is more than 107cycles.
  • Keywords
    Annealing; Capacitors; Character generation; Dielectrics; Electron traps; Temperature; Testing; Thermal stresses; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1983 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1983.190574
  • Filename
    1483699