DocumentCode
3556212
Title
Electric field and current dependence of SiO2 intrinsic breakdown
Author
Modelli, A. ; Ricco, B.
Author_Institution
SGS-Ates, Agrate Brianza, Italy
Volume
30
fYear
1984
fDate
1984
Firstpage
148
Lastpage
151
Abstract
A technique by which the oxide current and field can be varied independently is used to measure the dependence of the total injected charge at breakdown in thin SiO2 films. Contrary to previous results, this is found to be a well characterized, exponential function of the applied field regardless of oxide type and thickness as well as of current injection mode. The experimental results are also briefly discussed in the light of the available models for SiO2 high-field breakdown.
Keywords
Charge measurement; Conducting materials; Current measurement; Design for quality; Electric breakdown; Electrodes; Energy resolution; Gold; Threshold voltage; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1984 International
Type
conf
DOI
10.1109/IEDM.1984.190665
Filename
1484436
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