• DocumentCode
    3556225
  • Title

    GaAs/AlGaAs heterojunction bipolar transistors with very low base sheet resistance

  • Author

    Kofol, Steve ; Moll, Nick ; Gowen, Elmer ; Miller, Jaff

  • Author_Institution
    Hewlett-Packard Laboratories, Palo Alto, CA
  • Volume
    30
  • fYear
    1984
  • fDate
    1984
  • Firstpage
    198
  • Lastpage
    200
  • Abstract
    We have made mesa-type Npn heterojunction bipolar transistors with an AlGaAs emitter, an 800 Å thick GaAs drift field base, and a GaAs collector. The bases of these transistors have sheet resistances that are the lowest reported, to our knowledge. The fabrication uses a combination of selective wet and dry etching which allows us to contact the base directly using a self-aligned shallow Zn implant. DC and high-frequency (to 18 GHz) tests of these devices show that they have a base sheet resistance as low as 310 ohms/sq, while maintaining a quite adequate hfe of 30. The frequency of unity current gain for 3 micron wide emitter devices, constructed in the normal emitter-up configuration on an n+ substrate, is greater than 28 GHz.
  • Keywords
    Dry etching; Electrical resistance measurement; Fabrication; Gallium arsenide; Heterojunction bipolar transistors; Implants; Polyimides; Substrates; Wet etching; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1984 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1984.190678
  • Filename
    1484449