DocumentCode
3556274
Title
Monolithic intrinsic NMOS HgCdTe IRCCDs with on-chip signal processing
Author
Koch, T.L. ; Phillips, J.D.
Author_Institution
Santa Barbara Research Center, Goleta, California
Volume
30
fYear
1984
fDate
1984
Firstpage
374
Lastpage
377
Abstract
NMOS monolithic intrinsic infrared charge coupled devices (IRCCDs) fabricated on epitaxial layers of Hg1-x Cdx Te (x = 0.37) have been demonstrated. The arrays are fifty-five bit, four-phase surface channel devices with fifty front side illuminated MOS IR photodetectors. The devices have integrated reset floating diffusion amplifiers for performing true "on-chip" monolithic signal processing. Silicon dioxide and thermally deposited metals are used to form the insulators and gates. Shift registers have demonstrated charge transfer efficiencies greater than 0.9995. Multiplexed arrays have achived detectivities approaching 5 × 1012 cm-Hz1/2-W-1. The operational and detector radiometric data are presented and discussed.
Keywords
Array signal processing; Charge-coupled image sensors; Epitaxial layers; MOS devices; Mercury (metals); Metal-insulator structures; Photodetectors; Signal processing; Silicon compounds; Tellurium;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1984 International
Type
conf
DOI
10.1109/IEDM.1984.190727
Filename
1484498
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