• DocumentCode
    3556324
  • Title

    High-gain photodetectors in thin-film transistors fabricated from laser-crystallized silicon on fused silica

  • Author

    Chiang, A. ; Johnson, N.M.

  • Author_Institution
    Xerox Palo Alto Research Center, Palo Alto, CA
  • Volume
    30
  • fYear
    1984
  • fDate
    1984
  • Firstpage
    548
  • Lastpage
    551
  • Abstract
    We report the achievement of high-gain photoconduction in transistors fabricated in laser-crystallized silicon thin films on fused silica with responsivities of about 300 A/W for radiation in the visible spectrum. Such photodetectors are potentially useful in page-width linear document input scanners with higher speed and resolution than possible with any other thin-film sensor arrays. The basic mechanism for photconductivity consists of spatial separation of photogenerated electron-hole pairs across a p-n junction in the device body, collection of holes in the floating substrate, and Ohmic conduction of electrons in a buried channel. This model predicts a long carrier lifetime and is verified by a photocurrent decay time of ∼ 10 µs.
  • Keywords
    P-n junctions; Photoconductivity; Photodetectors; Semiconductor thin films; Sensor arrays; Silicon compounds; Spatial resolution; Substrates; Thin film sensors; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1984 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1984.190778
  • Filename
    1484549