DocumentCode
3556324
Title
High-gain photodetectors in thin-film transistors fabricated from laser-crystallized silicon on fused silica
Author
Chiang, A. ; Johnson, N.M.
Author_Institution
Xerox Palo Alto Research Center, Palo Alto, CA
Volume
30
fYear
1984
fDate
1984
Firstpage
548
Lastpage
551
Abstract
We report the achievement of high-gain photoconduction in transistors fabricated in laser-crystallized silicon thin films on fused silica with responsivities of about 300 A/W for radiation in the visible spectrum. Such photodetectors are potentially useful in page-width linear document input scanners with higher speed and resolution than possible with any other thin-film sensor arrays. The basic mechanism for photconductivity consists of spatial separation of photogenerated electron-hole pairs across a p-n junction in the device body, collection of holes in the floating substrate, and Ohmic conduction of electrons in a buried channel. This model predicts a long carrier lifetime and is verified by a photocurrent decay time of ∼ 10 µs.
Keywords
P-n junctions; Photoconductivity; Photodetectors; Semiconductor thin films; Sensor arrays; Silicon compounds; Spatial resolution; Substrates; Thin film sensors; Thin film transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1984 International
Type
conf
DOI
10.1109/IEDM.1984.190778
Filename
1484549
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