Title :
A fully self-aligned stacked CMOS 64K SRAM
Author :
Sundaresan, R. ; Malhi, S.D.S. ; Hite, L.R. ; Shah, A.H. ; Lam, H.W. ; Chatterjee, P.K.
Author_Institution :
Texas Instruments Incorporated, Dallas, Texas
Keywords :
Annealing; CMOS technology; Electrodes; Etching; Fabrication; Implants; Instruments; Plasma applications; Random access memory; Silicon;
Conference_Titel :
Electron Devices Meeting, 1984 International
DOI :
10.1109/IEDM.1984.190871
