• DocumentCode
    3556496
  • Title

    A new degradation mechanism of current drivability and reliability of asymmetrical LDDMOSFET´s

  • Author

    Mizuno, T. ; Matsumoto, Y. ; Sawada, S. ; Shinozaki, S. ; Ozawa, O.

  • Author_Institution
    Toshiba Corporation, Kawasaki, Japan
  • Volume
    31
  • fYear
    1985
  • fDate
    1985
  • Firstpage
    250
  • Lastpage
    253
  • Abstract
    Characteristics of asymmetrical LDDMOSFET´s fabricated by inclined n-ion implantation have been investigated. It has been newly found that current drivability and reliability of asymmetrical LDDMOSFET´s are affected by n-ion incident angle and the gate´s bird´s beak length. Symmetrical and shorter gate´s bird´s beak LDDMOSFET´s are more current drive capable than asymmetrical and longer ones. These results are well explained by our simple model. On the other hand, shorter drain n-- gate overlap and gate´s bird´s beak LDDMOSFET´s are less reliable than longer ones.
  • Keywords
    Degradation; Ion implantation; Laboratories; MOSFET circuits; Oxidation; Reliability engineering; Semiconductor devices; Substrates; Surface resistance; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1985 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1985.190943
  • Filename
    1485493