DocumentCode
3556496
Title
A new degradation mechanism of current drivability and reliability of asymmetrical LDDMOSFET´s
Author
Mizuno, T. ; Matsumoto, Y. ; Sawada, S. ; Shinozaki, S. ; Ozawa, O.
Author_Institution
Toshiba Corporation, Kawasaki, Japan
Volume
31
fYear
1985
fDate
1985
Firstpage
250
Lastpage
253
Abstract
Characteristics of asymmetrical LDDMOSFET´s fabricated by inclined n-ion implantation have been investigated. It has been newly found that current drivability and reliability of asymmetrical LDDMOSFET´s are affected by n-ion incident angle and the gate´s bird´s beak length. Symmetrical and shorter gate´s bird´s beak LDDMOSFET´s are more current drive capable than asymmetrical and longer ones. These results are well explained by our simple model. On the other hand, shorter drain n-- gate overlap and gate´s bird´s beak LDDMOSFET´s are less reliable than longer ones.
Keywords
Degradation; Ion implantation; Laboratories; MOSFET circuits; Oxidation; Reliability engineering; Semiconductor devices; Substrates; Surface resistance; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1985 International
Type
conf
DOI
10.1109/IEDM.1985.190943
Filename
1485493
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