DocumentCode :
3556519
Title :
AlGaAs/GaAs heterojunction bipolar transistors
Author :
Izawa, Tatsuo ; Ishibashi, Tadao ; Sugeta, Takayuki
Author_Institution :
NTT, Atsugi, Japan
Volume :
31
fYear :
1985
fDate :
1985
Firstpage :
328
Lastpage :
331
Abstract :
Heterojunction bipolar transistors (HBTs) are one of candidates for future ultrahigh speed devices. However, there are many problems that must be overcome to realize high-speed HBTs for practical use. Major problems remain in the fabrication processes of HBTs, reduction of parasitic elements and suppression of current gain reduction associated with transistor size scaling down. To eliminate the problems, a new sidewall insulation structure, a new self-alignment process with dry-etching techniques and a graded base structure have been introduced.
Keywords :
Contact resistance; Cutoff frequency; Electrodes; Gallium arsenide; Heterojunction bipolar transistors; Insulation; Laboratories; Parasitic capacitance; Photonic band gap; Propagation delay;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1985 International
Type :
conf
DOI :
10.1109/IEDM.1985.190965
Filename :
1485515
Link To Document :
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