DocumentCode
3556519
Title
AlGaAs/GaAs heterojunction bipolar transistors
Author
Izawa, Tatsuo ; Ishibashi, Tadao ; Sugeta, Takayuki
Author_Institution
NTT, Atsugi, Japan
Volume
31
fYear
1985
fDate
1985
Firstpage
328
Lastpage
331
Abstract
Heterojunction bipolar transistors (HBTs) are one of candidates for future ultrahigh speed devices. However, there are many problems that must be overcome to realize high-speed HBTs for practical use. Major problems remain in the fabrication processes of HBTs, reduction of parasitic elements and suppression of current gain reduction associated with transistor size scaling down. To eliminate the problems, a new sidewall insulation structure, a new self-alignment process with dry-etching techniques and a graded base structure have been introduced.
Keywords
Contact resistance; Cutoff frequency; Electrodes; Gallium arsenide; Heterojunction bipolar transistors; Insulation; Laboratories; Parasitic capacitance; Photonic band gap; Propagation delay;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1985 International
Type
conf
DOI
10.1109/IEDM.1985.190965
Filename
1485515
Link To Document