• DocumentCode
    3556519
  • Title

    AlGaAs/GaAs heterojunction bipolar transistors

  • Author

    Izawa, Tatsuo ; Ishibashi, Tadao ; Sugeta, Takayuki

  • Author_Institution
    NTT, Atsugi, Japan
  • Volume
    31
  • fYear
    1985
  • fDate
    1985
  • Firstpage
    328
  • Lastpage
    331
  • Abstract
    Heterojunction bipolar transistors (HBTs) are one of candidates for future ultrahigh speed devices. However, there are many problems that must be overcome to realize high-speed HBTs for practical use. Major problems remain in the fabrication processes of HBTs, reduction of parasitic elements and suppression of current gain reduction associated with transistor size scaling down. To eliminate the problems, a new sidewall insulation structure, a new self-alignment process with dry-etching techniques and a graded base structure have been introduced.
  • Keywords
    Contact resistance; Cutoff frequency; Electrodes; Gallium arsenide; Heterojunction bipolar transistors; Insulation; Laboratories; Parasitic capacitance; Photonic band gap; Propagation delay;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1985 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1985.190965
  • Filename
    1485515