DocumentCode :
3556636
Title :
Comparison of lateral and vertical DMOS specific on-resistance
Author :
Amato, Michael ; Rumennik, Vladimir
Author_Institution :
North American Philips Corporation, Briarcliff Manor, New York
Volume :
31
fYear :
1985
fDate :
1985
Firstpage :
736
Lastpage :
739
Abstract :
The specific on-resistance characteristics of the lateral and vertical DMOS transistors are compared for voltages between 50 and 800 volts. The vertical DMOS transistor´s breakdown and on-resistance relationship is reviewed, followed by modeling results of the lateral DMOS transistor´s breakdown and on-resistance characteristics. A direct comparison is then made between the vertical and lateral devices. The results indicate that the vertical device has lower specific on-resistance at low voltages because of its higher channel width/unit chip area packing. At higher voltages, the lateral device becomes equal to or better than the vertical device because of its ability to maintain a high drift region conductivity.
Keywords :
Conductivity; Electric breakdown; Electrodes; Frequency; Geometry; Integrated circuit yield; Laboratories; Low voltage; Power integrated circuits; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1985 International
Type :
conf
DOI :
10.1109/IEDM.1985.191081
Filename :
1485631
Link To Document :
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