DocumentCode :
3556667
Title :
A thermionic-diffusion model of polysilicon emitter
Author :
Ng, Chung C. ; Yang, Edward S.
Author_Institution :
Columbia University, New York, NY
Volume :
32
fYear :
1986
fDate :
1986
Firstpage :
32
Lastpage :
35
Abstract :
A model has been developed to characterize the hole current through an n-type polysilicon emitter in terms of thermionic emission acting in series with drift-diffusion. The thermionic emission results from the steep potential barrier which is induced by impurity segregation at the polysilicon-silicon interface. The total hole current, according to this model, depends on the peak doping concentration and the Gummel number of the monosilicon region of the emitter.
Keywords :
Bipolar transistors; Impurities; Kinetic energy; Photonic band gap; Reflection; Scattering; Surface cleaning; Temperature dependence; Thermionic emission; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1986 International
Type :
conf
DOI :
10.1109/IEDM.1986.191103
Filename :
1486361
Link To Document :
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