• DocumentCode
    3556765
  • Title

    Smear-less SOI image sensor

  • Author

    Senda, K. ; Fujii, E. ; Hiroshima, Y. ; Takamura, T.

  • Author_Institution
    Matsushita Electronics Corporation, Osaka, Japan
  • Volume
    32
  • fYear
    1986
  • fDate
    1986
  • Firstpage
    369
  • Lastpage
    372
  • Abstract
    An SOI image sensor where the read-out transistors are well isolated from the silicon substrate is proposed. The isolation results in remarkable reduction of the photo-leakage current to a value as low as 1/8000 times that in the conventional bulk transistors, implying the corresponding reduction of smear noise of the sensor. It is pointed out also that the parasitic capacitance of the vertical signal line in the SOI structure is reduced to a half value of that in the bulk structure. With the use of the large area seeding-region serving also as a photodiode region, a high-quality SOI film has been obtained by the laser recrystallization. The structure of the SOI image sensor is the hybrid integration of the SOI transistors and the bulk transistors. As a result, the video output signal of 50 pixels has been successfully obtained.
  • Keywords
    Circuits; Epitaxial growth; Image sensors; Optical noise; Photoconductivity; Photodiodes; Semiconductor device noise; Sensor phenomena and characterization; Silicon on insulator technology; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1986 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1986.191194
  • Filename
    1486452