DocumentCode
3556777
Title
On the impurity profiles of down scaled bipolar transistors
Author
Tang, D.D. ; Li, G.P. ; Chuang, C.T. ; Ning, T.H.
Author_Institution
IBM T.J. Watson Research Center, Yorktown Heights, N.Y.
Volume
32
fYear
1986
fDate
1986
Firstpage
412
Lastpage
415
Abstract
This paper presents the design and reliability issues unique to the scaled bipolar devices, which are caused by the close proximity of the heavily doped emitter and extrinsic base region and by the contradicting heat cycle requirement for the extrinsic base and intrinsic base. Issues related to the premature punchthrough, leakage around the emitter perimeter, long-term current gain degradation and the control of thin base are discussed.
Keywords
Abstracts; Bipolar transistors; Boron; Degradation; Doping; Impurities; Leakage current; Logic circuits; Logic devices; MOSFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1986 International
Type
conf
DOI
10.1109/IEDM.1986.191206
Filename
1486464
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