DocumentCode
3556790
Title
III-V heterojunction field effect transistor using indium alloys
Author
Eastman, L.F.
Volume
32
fYear
1986
fDate
1986
Firstpage
456
Lastpage
459
Abstract
Modulation-doped field effect transistors (MODFET´s) using Al,GaAs and GaAs have shown interesting but limited improvements in performance over those of GaAs metal semiconductors field effect transistors (MESFET´s). The use of indium alloys can be made to improve the properties of the active channel and the barrier confining the electrons. When indium is alloyed into GaAs the electron transport along the active channel is improved. An excellent example is that of Ga.47 In.53 As active channel grown lattice-matched on InP. The low-field mobility of electrons is raised by 50% at room temperature, and for .25 micron gate length, the electron average transit velocity is also raised by about this much at room temperature. Very high potential barriers of .5 eV can be achieved for electrons on this active layer by using Al.48 In.52 As, helping to confine energetic electrons. It is also possible to grow thin Inx Ga1-x As layers with x < .20 on GaAs, and achieve part of these result even with the resulting lattice mismatch. The resulting reduction of bandgap when x rises above 0 also helps raise the potential barrier confining electrons. When Aly Ga1-y AS is used to confine electrons to GaAs (or Inx Ga1-x As), any necessary Si donors in the Aly Ga1-y As have a sharp increase in ionization energy for y ≥ .20 or so. The potential barrier is only .16-eV in the conduction band for Al.2 Ga.8 As. If (Alz Ga1-z ).51 In.49 P is grown lattice matched to GaAs, the donor ionization energy is low up to z = .3, where the conduction band potential barrier for electrons is .32 eV. Thus even GaAs MODFET´s will yield improved performance, due to better electron confinement, when indium alloy barriers are used. Predictions of MODFET fT values of over 100 GHz for active channel of lattice mismatched Inx Ga1-x As on GaAs and over 120 GHz for In.53 Ga.47 As on InP are made for .25 µm gates at room temperature, compared to ≥ 80 GHz fT values achieved for Al, GaAs/GaAs MODFETs. Structures for impr- oved performance of the various MODFETs for switching and microwave operation are presented.
Keywords
Electrons; FETs; Gallium arsenide; HEMTs; Heterojunctions; III-V semiconductor materials; Indium; Lattices; MODFETs; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1986 International
Type
conf
DOI
10.1109/IEDM.1986.191218
Filename
1486476
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