• DocumentCode
    3556882
  • Title

    Performance of digital GaAs E/D MESFET circuits fabricated in GaAs-on-Si substrate

  • Author

    Shichijo, H. ; Lee, J.W. ; McLevige, W.V. ; Taddiken, A.

  • Author_Institution
    Texas Instruments, Incorporated, Dallas, Texas
  • Volume
    32
  • fYear
    1986
  • fDate
    1986
  • Firstpage
    748
  • Lastpage
    751
  • Abstract
    A functional GaAs enhancement/ deplet on (E/D) 1K-bit SRAM and other digital circuits have been fabricated in a GaAs layer grown by MBE on a silicon substrate. These are the most complex digital circuits reported to date for GaAs-on-Si material. The device performance is compared with the bulk GaAs devices fabricated concurrently using identical processes. The average transconductances of enhancement and depletion FETs are found to be approximately 80% of those for bulk GaAs devices. A threshold voltage standard deviation as small as 27 mV across a two inch wafer has been realized. The GaAs-on-Si 1K-bit SRAM has row address access times ranging from 6 to 14 nsec which compares favorably to 4 to 12 nsec for the same SRAMs in bulk GaAs slices.
  • Keywords
    Annealing; Application specific integrated circuits; Digital circuits; Fabrication; Gallium arsenide; MESFET circuits; Optical devices; Random access memory; Silicon; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1986 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1986.191302
  • Filename
    1486560