• DocumentCode
    3556887
  • Title

    High-power high-efficiency stable indium phosphide MISFETs

  • Author

    Messick, L. ; Collins, D.A. ; Nguyen, R. ; Clawson, A.R. ; McWilliams, G.E.

  • Author_Institution
    Naval Ocean Systems, San Diego, CA
  • Volume
    32
  • fYear
    1986
  • fDate
    1986
  • Firstpage
    767
  • Lastpage
    770
  • Abstract
    In P MISFETs with gate widths up to 1 mm using SiO2as the gate insulator have been fabricated. At 9.7 GHz the highest power output with 4 dB gain was 4.5 W at 46% power-added efficiency corresponding to a power density of 4.5 W/mm of gate width. The maximum power-added efficiency for the same device and frequency was 50% at 3.8 W and 3.8 dB gain. This power is more than 3.5 times the previously reported maximum for InP FETs at 15% higher power-added efficiency and the power per unit gate width is more than three times that of the best GaAs FET. Power output was stable to within 2% over 167 hours of continuous operation.
  • Keywords
    Conducting materials; FETs; Gain; Gallium arsenide; Indium phosphide; Insulation; Leakage current; MESFETs; MISFETs; Microwave devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1986 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1986.191307
  • Filename
    1486565