Title :
New SOI CMOS process with selective oxidation
Author :
Kubota, M. ; Tamaki, T. ; Kawakita, K. ; Nomura, N. ; Takemoto, T.
Author_Institution :
Matsushita Electric Industrial Co., Ltd. , Osaka, Japan
Keywords :
Anisotropic magnetoresistance; CMOS process; CMOS technology; Electrical equipment industry; Etching; Fabrication; MOSFETs; Oxidation; Silicon on insulator technology; Very large scale integration;
Conference_Titel :
Electron Devices Meeting, 1986 International
DOI :
10.1109/IEDM.1986.191322
