• DocumentCode
    3556992
  • Title

    GaAs-on-silicon integrated circuits; Savior for GaAs ? or for Si ?

  • Author

    Shichijo, H. ; Matyi, R.J.

  • Author_Institution
    Texas Instruments Incorporated, Dallas, TX
  • Volume
    33
  • fYear
    1987
  • fDate
    1987
  • Firstpage
    88
  • Lastpage
    91
  • Abstract
    "GaAs-on-Si" refers to thin epitaxial layers of GaAs grown on silicon substrates. This paper will review some of the recent progress in materials growth and in device and circuit developments using such materials, and will attempt to evaluate the impact of this emerging technology on existing GaAs and Si IC technologies.
  • Keywords
    Atomic layer deposition; Circuits; Gallium arsenide; Lattices; MOCVD; Molecular beam epitaxial growth; Optical materials; Silicon; Substrates; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1987 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1987.191356
  • Filename
    1487314