Title :
Device design considerations of a novel high voltage amorphous silicon thin film transistor
Author :
Martin, Russel A. ; Yap, Peng Kein ; Hack, Michael ; Tuan, Hsing
Author_Institution :
Xerox Palo Alto Research Center, Palo Alto, CA
Abstract :
The performance of a novel high voltage thin film transistor has been characterized in terms of its geometry and operating conditions. Excellent performance, suitable for large-area electronic application, is achieved for optimized designs. An analytical model is found to fit the performance well.
Keywords :
Amorphous silicon; Dielectric substrates; Electrodes; Etching; Geometry; Insulation; Liquid crystal displays; Low voltage; MOSFETs; Thin film transistors;
Conference_Titel :
Electron Devices Meeting, 1987 International
DOI :
10.1109/IEDM.1987.191453
