DocumentCode :
3557115
Title :
Modeling of hot carrier effects based on two-dimensional distribution of electron temperature
Author :
Horiuchi, Tadahiko ; Fukuma, Masao ; Mikoshiba, Hiroaki
Author_Institution :
NEC Corporation, Kanagawa, Japan
Volume :
33
fYear :
1987
fDate :
1987
Firstpage :
506
Lastpage :
509
Abstract :
A model to predict device lifetime from substrate current is proposed by taking two-dimensional distribution of electron temperature into account. Experimental results can be reproduced by the model under any bias conditions used. Validity of this model is examined by using two-dimensional device simulator which includes energy transport.
Keywords :
Charge carrier processes; Degradation; Electrons; Hot carrier effects; Interface states; MOSFETs; National electric code; Stress; Substrates; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1987 International
Type :
conf
DOI :
10.1109/IEDM.1987.191471
Filename :
1487429
Link To Document :
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