DocumentCode
3557127
Title
Programming mode dependent degradation of tunnel oxide floating gate devices
Author
Witters, J.S. ; Groeseneken, G. ; Maes, H.E.
Author_Institution
IMEC Leuven, Belgium
Volume
33
fYear
1987
fDate
1987
Firstpage
544
Lastpage
547
Abstract
The degradation of floating gate EEPROM devices is studied by measurements directly on the memory devices. An important tool for the characterization of the degradation behaviour is the charge pumping technique, which is used to determine the interface state generation and the trapped charges in the memory cell. Different degradation behaviours, dependent on the programming mode are explained and qualitatively simulated. A measurement procedure allowing to perform subsequent degradation measurements on the same device is introduced. The effect of the programming conditions on the resulting degradation is shown.
Keywords
Charge measurement; Charge pumps; Current measurement; Degradation; EPROM; Interface states; Nonvolatile memory; Stress; Threshold voltage; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1987 International
Type
conf
DOI
10.1109/IEDM.1987.191483
Filename
1487441
Link To Document