• DocumentCode
    3557145
  • Title

    Dependence of base built-in field for InAlAs/InGaAs HBT characteristics

  • Author

    Furukawa, A. ; Ohta, K. ; Baba, T.

  • Author_Institution
    NEC Corporation Kawasaki, Japan
  • Volume
    33
  • fYear
    1987
  • fDate
    1987
  • Firstpage
    615
  • Lastpage
    618
  • Abstract
    This paper presents the dependence of current gain on base built-in field for npn InAlAs/InGaAs HBTs in a wide field range (0-50 kV/cm) from 300 K to 77 K. Current gain increases with increasing base built-in field up to 30 kV/cm, and then decreases at higher field. These results were analyzed by taking into account the electron transfer between Γ-L valleys, and respective recombination process. A semi-quantitative agreement with experiments was obtained. Increase in the current gain at lower field is understood considering the acceleration of electron by the built-in field and decrease at higher field is due to low velocity of electrons transferred to L valley.
  • Keywords
    Acceleration; Doping; Electrons; Heterojunction bipolar transistors; Indium compounds; Indium gallium arsenide; Indium phosphide; Lattices; National electric code; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1987 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1987.191502
  • Filename
    1487460