DocumentCode :
3557145
Title :
Dependence of base built-in field for InAlAs/InGaAs HBT characteristics
Author :
Furukawa, A. ; Ohta, K. ; Baba, T.
Author_Institution :
NEC Corporation Kawasaki, Japan
Volume :
33
fYear :
1987
fDate :
1987
Firstpage :
615
Lastpage :
618
Abstract :
This paper presents the dependence of current gain on base built-in field for npn InAlAs/InGaAs HBTs in a wide field range (0-50 kV/cm) from 300 K to 77 K. Current gain increases with increasing base built-in field up to 30 kV/cm, and then decreases at higher field. These results were analyzed by taking into account the electron transfer between Γ-L valleys, and respective recombination process. A semi-quantitative agreement with experiments was obtained. Increase in the current gain at lower field is understood considering the acceleration of electron by the built-in field and decrease at higher field is due to low velocity of electrons transferred to L valley.
Keywords :
Acceleration; Doping; Electrons; Heterojunction bipolar transistors; Indium compounds; Indium gallium arsenide; Indium phosphide; Lattices; National electric code; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1987 International
Type :
conf
DOI :
10.1109/IEDM.1987.191502
Filename :
1487460
Link To Document :
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