• DocumentCode
    3557475
  • Title

    ESD Scalability of LDMOS Devices for Self-Protected Output Drivers

  • Author

    Chung, Young ; Xu, Hongzhong ; Ida, Richard ; Min, Won-Gi ; Baird, Bob

  • Author_Institution
    SMARTMOS Technol. Center, Freescale Semicond. Inc., Tempe, AZ
  • fYear
    2005
  • fDate
    23-26 May 2005
  • Firstpage
    351
  • Lastpage
    354
  • Abstract
    Lateral DMOS (LDMOS) power transistors of SMART technologies are widely used as output drivers in multiple applications. However, LDMOS devices are generally not robust under ESD due to deep snapback causing localized current crowding and leading to inhomogeneous triggering of the parasitic bipolar, ESD ruggedness of LDMOS power devices has been a significant subject in smart power IC technology. Lack of understanding in geometry scalability of the LDMOS devices often thwarts a proper implementation of self-protected structures. Therefore, it is necessary to understand the ESD scalability and failure mechanism of the power output devices to meet various levels of design requirement and optimize ESD protection solution. LDMOS devices ESD capability has been understood from snapback breakdown of the parasitic bipolar components. They usually show different behavior under ESD stress conditions, compared to the normal MOS transistors. The triggering mechanism of the snapback breakdown has been major subjects in terms of device structures and designs. In this paper, we report an ESD capability and scalability of the LDMOS devices from the geometry and operational aspects, employing both experimental and simulation data. Difference of transient electrical behaviors and failure mechanisms of DMOS with different geometries under ESD stress conditions is also addressed
  • Keywords
    electrostatic discharge; failure analysis; power MOSFET; semiconductor device breakdown; semiconductor device models; ESD capability; ESD protection; ESD scalability; LDMOS devices; Lateral DMOS power transistors; electrostatic discharge; failure analysis; failure mechanisms; optimisation; power MOSFET; self-protected output drivers; semiconductor device breakdown; semiconductor device models; snapback breakdown; transient electrical behaviors; transmission lines; Driver circuits; Electric breakdown; Electrostatic discharge; Failure analysis; Geometry; Power transistors; Proximity effect; Robustness; Scalability; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 2005. Proceedings. ISPSD '05. The 17th International Symposium on
  • Conference_Location
    Santa Barbara, CA
  • Print_ISBN
    0-7803-8890-9
  • Type

    conf

  • DOI
    10.1109/ISPSD.2005.1488023
  • Filename
    1488023