DocumentCode :
3557584
Title :
Post-deposition annealing of thin film CuInS2 made from a single-source precursor
Author :
Jin, Michael H. ; Banger, Kulbinder K. ; McNatt, Jeremiah S. ; Kelly, Christopher V. ; Dickman, John E. ; Hepp, Aloysius F.
Author_Institution :
Ohio Aerosp. Inst., Brook Park, OH, USA
fYear :
2005
fDate :
3-7 Jan. 2005
Firstpage :
382
Lastpage :
385
Abstract :
Analysis of the radiative recombination processes in CuInS2 thin films deposited using a single-source precursor was made. The photoluminescence spectrum is dominated by donor-acceptor transitions and post-deposition annealing under sulfur gas quenched the transitions associated with sulfur vacancy indicating extra sulfur was incorporated into the films passivating the vacancies. In addition, a part of the broad emission band (between 1.24 eV and 1.32 eV) was lowered by S-annealing. Ar-annealing without sulfur also improved crystallinity of the films - X-ray diffraction showed diffraction peaks as sharp as those from S-annealing. However, the emission related to the deep defects was not reduced and the creation of sulfur vacancies increased the emission bands at 1.45 eV and 1.32 eV.
Keywords :
X-ray diffraction; annealing; copper compounds; electron-hole recombination; impurity states; indium compounds; passivation; photoluminescence; semiconductor thin films; ternary semiconductors; vacancies (crystal); 1.24 to 1.32 eV; 1.45 eV; CuInS2; CuInS2 thin films; X-ray diffraction; crystallinity; donor-acceptor transitions; emission band; photoluminescence spectrum; post-deposition annealing; radiative recombination process; single-source precursor; sulfur incorporation; sulfur vacancy; vacancy passivation; Annealing; Argon; Photoluminescence; Photovoltaic cells; Semiconductor films; Space missions; Sputtering; Substrates; Transistors; X-ray diffraction;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
ISSN :
0160-8371
Print_ISBN :
0-7803-8707-4
Type :
conf
DOI :
10.1109/PVSC.2005.1488149
Filename :
1488149
Link To Document :
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