Title :
Measurements on monocrystalline CuInSe2 cells
Author :
Champness, C.H. ; Du, H. ; Shih, I.
Author_Institution :
Electr. & Comput. Eng. Dept., McGill Univ., Montreal, Que., Canada
Abstract :
A series of measurements has been made on a number of photovoltaic cells fabricated with the layer structure Au-CuInSe2-CdS-ZnO-In, where the CuInSe2 consisted of a wafer of p-type monocrystalline material cut from an ingot grown by a vertical Bridgman method. A plot of conversion efficiency (η) and short circuit current density (jSC) against cell series resistance (RAS), obtained from dark current-voltage characteristics, indicated a general increase of η and jSC with decrease of RAS. The measurements also showed a general increase of jSC with increase of the apparent hole concentration, pMS, obtained from Mott-Schottky plot slopes. Minority diffusion length estimates, obtained by the photo-current-capacitance method, were found to decrease with increase of pMS. As a result, surprisingly, diffusion lengths were smaller in the better performance cells. The best monocrystalline CuInSe2 cell had an original total area efficiency of 11.4% (or 12.5 %, active area), without an A.R. coating.
Keywords :
carrier lifetime; copper compounds; current density; dark conductivity; electrical resistivity; hole density; indium compounds; photocapacitance; photoconductivity; short-circuit currents; solar cells; ternary semiconductors; 11.4 percent; 12.5 percent; Au-CuInSe2-CdS-ZnO-In; Minority diffusion length; Mott-Schottky plot slopes; apparent hole concentration; cell series resistance; conversion efficiency; dark current-voltage characteristics; ingot; monocrystalline CuInSe2 cells; p-type monocrystalline material; photo-current-capacitance method; photovoltaic cells; total area efficiency; vertical Bridgman method; Circuits; Current density; Current measurement; Density measurement; Fabrication; Indium; Length measurement; Voltage; Wavelength measurement; Zinc oxide;
Conference_Titel :
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
Print_ISBN :
0-7803-8707-4
DOI :
10.1109/PVSC.2005.1488154