• DocumentCode
    3558122
  • Title

    Bias-dependent 1/f noise model of an m.o.s. transistor

  • Author

    Backensto, W.V. ; Viswananathan, C.R.

  • Author_Institution
    Hughes Aircraft Company, Culver City, USA
  • Volume
    127
  • Issue
    2
  • fYear
    1980
  • fDate
    4/1/1980 12:00:00 AM
  • Firstpage
    87
  • Lastpage
    93
  • Abstract
    A 1/f noise model of an m.o.s. transistor is developed which verifies previously observed dependences on the geometry and the density of surface states, but in addition predicts an explicit bias dependence. This model predicts that input 1/f voltage noise gradually increases as the gate voltage increases near threshold and continues to increase for gate voltages well above threshold. It also predicts a gradual decrease in noise as the drain voltage increases to saturation. These prediction are experimentally verified.
  • Keywords
    electron device noise; insulated gate field effect transistors; random noise; semiconductor device models; 1/f noise; IGFET; MOST; bias dependent semiconductor device models; drain voltage; electron device noise; gate voltage; surface states; threshold;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Proceedings I
  • Publisher
    iet
  • Conference_Location
    4/1/1980 12:00:00 AM
  • ISSN
    0143-7100
  • Type

    jour

  • DOI
    10.1049/ip-i-1.1980.0016
  • Filename
    4642481