Title :
Bias-dependent 1/f noise model of an m.o.s. transistor
Author :
Backensto, W.V. ; Viswananathan, C.R.
Author_Institution :
Hughes Aircraft Company, Culver City, USA
fDate :
4/1/1980 12:00:00 AM
Abstract :
A 1/f noise model of an m.o.s. transistor is developed which verifies previously observed dependences on the geometry and the density of surface states, but in addition predicts an explicit bias dependence. This model predicts that input 1/f voltage noise gradually increases as the gate voltage increases near threshold and continues to increase for gate voltages well above threshold. It also predicts a gradual decrease in noise as the drain voltage increases to saturation. These prediction are experimentally verified.
Keywords :
electron device noise; insulated gate field effect transistors; random noise; semiconductor device models; 1/f noise; IGFET; MOST; bias dependent semiconductor device models; drain voltage; electron device noise; gate voltage; surface states; threshold;
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Conference_Location :
4/1/1980 12:00:00 AM
DOI :
10.1049/ip-i-1.1980.0016