DocumentCode :
3558122
Title :
Bias-dependent 1/f noise model of an m.o.s. transistor
Author :
Backensto, W.V. ; Viswananathan, C.R.
Author_Institution :
Hughes Aircraft Company, Culver City, USA
Volume :
127
Issue :
2
fYear :
1980
fDate :
4/1/1980 12:00:00 AM
Firstpage :
87
Lastpage :
93
Abstract :
A 1/f noise model of an m.o.s. transistor is developed which verifies previously observed dependences on the geometry and the density of surface states, but in addition predicts an explicit bias dependence. This model predicts that input 1/f voltage noise gradually increases as the gate voltage increases near threshold and continues to increase for gate voltages well above threshold. It also predicts a gradual decrease in noise as the drain voltage increases to saturation. These prediction are experimentally verified.
Keywords :
electron device noise; insulated gate field effect transistors; random noise; semiconductor device models; 1/f noise; IGFET; MOST; bias dependent semiconductor device models; drain voltage; electron device noise; gate voltage; surface states; threshold;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Publisher :
iet
Conference_Location :
4/1/1980 12:00:00 AM
ISSN :
0143-7100
Type :
jour
DOI :
10.1049/ip-i-1.1980.0016
Filename :
4642481
Link To Document :
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