• DocumentCode
    3558144
  • Title

    Conduction in sputtered a-Si-H Schottky-barrier solar cells

  • Author

    Thompson, M.J. ; Alkaisi, M.M. ; Allison, J.

  • Author_Institution
    University of Sheffield, Department of Electronic & Electrical Engineering, Sheffield, UK
  • Volume
    127
  • Issue
    4
  • fYear
    1980
  • fDate
    8/1/1980 12:00:00 AM
  • Firstpage
    212
  • Lastpage
    217
  • Abstract
    This paper describes the conduction mechanisms in r.f.-sputtered Schottky-barrier solar cells incorporating hydrogenated amorphous Si (a-Si-H). The illumination and temperature dependence of the open-circuit voltage(VOC) and the short-circuit current (Js¿c) of the cells are discussed. The properties of the cells containing optimum and nonoptimum a-Si-H and various Schottky metals are contrasted. The temperature dependence of the forward characteristics of the cells is also examined. Three different conduction mechanisms in the Schottky-barrier cells are identified and described.
  • Keywords
    Schottky effect; amorphous semiconductors; elemental semiconductors; hydrogen; radiofrequency sputtering; silicon; solar cells; RF sputtering; amorphous Si:H Schottky barrier solar cells; conductance mechanism; illumination; open circuit voltage; short circuit current;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Proceedings I
  • Publisher
    iet
  • Conference_Location
    8/1/1980 12:00:00 AM
  • ISSN
    0143-7100
  • Type

    jour

  • DOI
    10.1049/ip-i-1.1980.0043
  • Filename
    4642510