• DocumentCode
    3558158
  • Title

    Quasistatic and nonequilibrium phenomena in m.o.s. structures under the influence of a constant gate-current bias

  • Author

    Allman, P.G.C. ; Simmons, J.G.

  • Author_Institution
    University of Durham, Department of Applied Physics and Electronics, Durham, UK
  • Volume
    127
  • Issue
    6
  • fYear
    1980
  • fDate
    12/1/1980 12:00:00 AM
  • Firstpage
    312
  • Lastpage
    316
  • Abstract
    An experimental investigation is undertaken into the quasistatic and nonequilibrium response of an m.o.s. system to a constant gate-current bias. For the quasistatic condition, it is shown that the inverse total semiconductor capacitance can be extracted directly, in contrast to the slow-ramp quasistatic C/V measurement. Under nonequilibrium conditions the main aim has been to investigate the effect on the characteristics of current magnitude and temperature. The nonequilibrium characteristics are rich in structure and yield useful information on bulk-trap generation rate and interface trap emission.
  • Keywords
    electron traps; interface electron states; metal-insulator-semiconductor structures; MOS structures; constant gate current bias; current magnitude effect; interface trap emission; inverse total semiconductor capacitance; link trap generation rate; nonequilibrium response; quasistatic phenomenon; temperature effect;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Proceedings I
  • Publisher
    iet
  • Conference_Location
    12/1/1980 12:00:00 AM
  • ISSN
    0143-7100
  • Type

    jour

  • DOI
    10.1049/ip-i-1.1980.0061
  • Filename
    4642530