DocumentCode
3558158
Title
Quasistatic and nonequilibrium phenomena in m.o.s. structures under the influence of a constant gate-current bias
Author
Allman, P.G.C. ; Simmons, J.G.
Author_Institution
University of Durham, Department of Applied Physics and Electronics, Durham, UK
Volume
127
Issue
6
fYear
1980
fDate
12/1/1980 12:00:00 AM
Firstpage
312
Lastpage
316
Abstract
An experimental investigation is undertaken into the quasistatic and nonequilibrium response of an m.o.s. system to a constant gate-current bias. For the quasistatic condition, it is shown that the inverse total semiconductor capacitance can be extracted directly, in contrast to the slow-ramp quasistatic C/V measurement. Under nonequilibrium conditions the main aim has been to investigate the effect on the characteristics of current magnitude and temperature. The nonequilibrium characteristics are rich in structure and yield useful information on bulk-trap generation rate and interface trap emission.
Keywords
electron traps; interface electron states; metal-insulator-semiconductor structures; MOS structures; constant gate current bias; current magnitude effect; interface trap emission; inverse total semiconductor capacitance; link trap generation rate; nonequilibrium response; quasistatic phenomenon; temperature effect;
fLanguage
English
Journal_Title
Solid-State and Electron Devices, IEE Proceedings I
Publisher
iet
Conference_Location
12/1/1980 12:00:00 AM
ISSN
0143-7100
Type
jour
DOI
10.1049/ip-i-1.1980.0061
Filename
4642530
Link To Document