DocumentCode :
3558228
Title :
High-voltage device termination techniques a comparative review
Author :
Baliga, B.Jayant
Author_Institution :
General Electric Company, Corporate Research & Development Center, Schenectady, USA
Volume :
129
Issue :
5
fYear :
1982
fDate :
10/1/1982 12:00:00 AM
Firstpage :
173
Lastpage :
179
Abstract :
High-voltage power device performance is often limited by the ability to approach nearly ideal behaviour at the edges of the chip. Consequently, a large number of termination techniques have been explored to reduce the surface electric field at the edges of devices, and so to maximise the breakdown voltage. The paper provides a review of these techniques. A comparison between the various approaches is then performed with consideration for device type (thyristors, field-effect transistors, transistors etc.) and device die size. This comparison is intended to serve as a guide to choosing the device termination appropriate for each application.
Keywords :
bipolar transistors; insulated gate field effect transistors; power transistors; reviews; thyristors; MOSFET; bipolar transistor; breakdown voltage; device die size; high voltage power devices; review; surface electric field; termination techniques; thyristor;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Publisher :
iet
Conference_Location :
10/1/1982 12:00:00 AM
ISSN :
0143-7100
Type :
jour
DOI :
10.1049/ip-i-1.1982.0037
Filename :
4642637
Link To Document :
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