Title :
High-voltage device termination techniques a comparative review
Author :
Baliga, B.Jayant
Author_Institution :
General Electric Company, Corporate Research & Development Center, Schenectady, USA
fDate :
10/1/1982 12:00:00 AM
Abstract :
High-voltage power device performance is often limited by the ability to approach nearly ideal behaviour at the edges of the chip. Consequently, a large number of termination techniques have been explored to reduce the surface electric field at the edges of devices, and so to maximise the breakdown voltage. The paper provides a review of these techniques. A comparison between the various approaches is then performed with consideration for device type (thyristors, field-effect transistors, transistors etc.) and device die size. This comparison is intended to serve as a guide to choosing the device termination appropriate for each application.
Keywords :
bipolar transistors; insulated gate field effect transistors; power transistors; reviews; thyristors; MOSFET; bipolar transistor; breakdown voltage; device die size; high voltage power devices; review; surface electric field; termination techniques; thyristor;
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Conference_Location :
10/1/1982 12:00:00 AM
DOI :
10.1049/ip-i-1.1982.0037