DocumentCode :
3558265
Title :
High-density one-device dynamic MOS memory cells
Author :
Itoh, Kiyoo ; Sunami, Hideo
Author_Institution :
Hitachi Ltd., Central Research Laboratory, Kitatama, Japan
Volume :
130
Issue :
3
fYear :
1983
fDate :
6/1/1983 12:00:00 AM
Firstpage :
127
Lastpage :
135
Abstract :
Performance of one-device cells for dynamic random-access memories is described in terms of signal, noise, speed, soft error and process complexity. From an examination of areal layout and cross-section, five kinds of cells used in commercially available 64 Kbit DRAMs are compared, placing stress on the concept of the folded-data and open-data lines. Somes new DRAM cell concepts, such as a vertically structured capacitor, are proposed on the basis of the paper. The future application limit of the one-device cell seems to exist in the optical lithography of the next generation DRAM of 1 Mbit and beyond, not in the device concept itself.
Keywords :
field effect integrated circuits; integrated circuit technology; integrated memory circuits; random-access storage; 64K DRAM; MOS memory cells; VLSI; dynamic RAM; folded data lines; memory cell signal; noise; one-device cells; open-data lines; optical lithography; process complexity; random-access memories; soft error; speed; vertically structured capacitor;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Publisher :
iet
Conference_Location :
6/1/1983 12:00:00 AM
ISSN :
0143-7100
Type :
jour
DOI :
10.1049/ip-i-1.1983.0024
Filename :
4642693
Link To Document :
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