• DocumentCode
    3558268
  • Title

    Transit and storage times of bipolar transistors in a VLSI environment

  • Author

    Rofail, S.S.

  • Author_Institution
    University of Petroleum and Minerals, Dhahran, Saudi Arabia
  • Volume
    130
  • Issue
    3
  • fYear
    1983
  • fDate
    6/1/1983 12:00:00 AM
  • Firstpage
    151
  • Lastpage
    152
  • Abstract
    The main objective of the work is to study the effects of the physical and technology parameters on the delay times of bipolar transistors in a VLSI environment. Expressions for the transit time in a very narrow base, and the storage time due to the minority charge in the emitter region will be derived. The analysis will be performed using typical substrate (which is the emitter in I2 L structures having zero epitaxial width) profiles, obtained from measurements. The results and conclusions can be used to tailor an optimum impurity profile that gives minimum storage time.
  • Keywords
    bipolar integrated circuits; integrated injection logic; large scale integration; I2L structures; VLSI; bipolar ICs; bipolar transistors; delay times; minority charge; storage times; transit time;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Proceedings I
  • Publisher
    iet
  • Conference_Location
    6/1/1983 12:00:00 AM
  • ISSN
    0143-7100
  • Type

    jour

  • DOI
    10.1049/ip-i-1.1983.0027
  • Filename
    4642696