DocumentCode :
3559181
Title :
Recent advances in high-k nanocomposite materials for embedded capacitor applications
Author :
Lu, Jiongxin ; Wong, C.P.
Author_Institution :
Sch. of Mater. Sci. & Eng., Georgia Inst. of Technol., Atlanta, GA
Volume :
15
Issue :
5
fYear :
2008
fDate :
10/1/2008 12:00:00 AM
Firstpage :
1322
Lastpage :
1328
Abstract :
In this paper, a wide variety of high dielectric constant (k) composite materials which have been developed and evaluated for embedded capacitor application are reviewed. Current research efforts toward achieving high dielectric performance including high-k and low dielectric loss for polymer composites are presented. New insights into the effect of unique properties of the nanoparticle filler, filler modification and the dispersion between filler and polymer matrix on the dielectric properties of the nanocomposites are discussed in details.
Keywords :
capacitors; dielectric losses; filled polymers; high-k dielectric thin films; nanocomposites; nanoparticles; dielectric loss; high-k nanocomposite materials; nanoparticle filler; polymer matrix; Capacitors; Composite materials; Dielectric losses; Dispersion; High K dielectric materials; High-K gate dielectrics; Nanocomposites; Nanostructured materials; Performance loss; Polymers; Dielectric materials; capacitors; nanocomposites; nanotechnology;
fLanguage :
English
Journal_Title :
Dielectrics and Electrical Insulation, IEEE Transactions on
Publisher :
ieee
Conference_Location :
10/1/2008 12:00:00 AM
ISSN :
1070-9878
Type :
jour
DOI :
10.1109/TDEI.2008.4656240
Filename :
4656240
Link To Document :
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