DocumentCode :
3560160
Title :
Electric and Magnetic Properties of Multiferroic BiFeO 
and YMnO Thin Films
Author :
Zapata, J. ; Narv??ez, J. ; Lopera, W. ; G?³mez, M.E. ; Mendoza, G.A. ; Prieto, Pablo
Volume :
44
Issue :
11
fYear :
2008
Firstpage :
2895
Lastpage :
2898
Abstract :
We grew rhombohedrally distorted BiFeO 3 and hexagonal YMnO 3 thin films on Pt/TiO 2/SiO 2/Si substrates via RF magnetron sputtering technique in a pure oxygen atmosphere. BiFeO 3 and YMnO 3 targets were self-made by the usual solid-state reaction method. We investigated the effects of deposition temperature upon crystalline structure, surface morphology, magnetization, and electrical polarization of BiFeO3 and YMnO3 thin films. The crystalline structure was studied by X-ray diffraction, and the topography of film surface was analyzed by atomic force microscopy. We also conducted measurements of ferroelectric and ferromagnetic hysteresis loops to study the electrical and magnetic behavior of the samples. Polarization, as a function of electric field in capacitor structures based on our BiFeO3 films, shows hysteretic behavior with a coercive field of 54 kV/cm and a remanent polarization of 21 muC/cm2; whereas, YMnO3 films show hysteretic behavior with coercive field of 2.4 kV/cm, remanent polarization of 1.2 muC/cm2, and saturation polarization of 3.5 mu C/cm2 . Magnetization measurements of the BiFeO 3 films evidence weak ferromagnetism, that can be related to the presence of a small quantity of ferromagnetic impurities.
Keywords :
X-ray diffraction; atomic force microscopy; bismuth compounds; coercive force; crystal structure; dielectric hysteresis; dielectric polarisation; ferroelectric coercive field; ferroelectric thin films; magnetic hysteresis; magnetic impurities; multiferroics; platinum; remanence; silicon; silicon compounds; sputter deposition; surface morphology; titanium compounds; yttrium compounds; BiFeO3; Pt-TiO2-SiO2-Si; RF magnetron sputtering technique; X-ray diffraction; YMnO3; atomic force microscopy; capacitor structures; coercive field; crystalline structure; deposition temperature effects; electric field; electric properties; electrical remanent polarization; ferroelectric hysteresis loops; ferromagnetic hysteresis loops; ferromagnetic impurities; film topography; hexagonal films; magnetic properties; magnetization; multiferroic thin films; oxygen atmosphere; rhombohedrally distorted films; solid-state reaction method; surface morphology; Ferroelectric and magnetic films; magnetoelectric materials; materials oxide thin films; sputtering;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2008.2002473
Filename :
4717501
Link To Document :
