Title :
Focused MOKE Study of Self-Assembly Nanoscale Fe
Ni
Dot Arrays
Author :
Niu, D.X. ; Zou, X. ; Wu, J. ; Xu, Y.B.
Author_Institution :
Dept. of Electron., Univ. of York, York
Abstract :
Using nanosphere lithography (NSL) technique, we have fabricated well defined triangular shaped Fe64Ni36 dot arrays with feature size down to 30 nm on silicon substrate. In-plane focused magneto-optical Kerr effect (MOKE) measurements show that these nanoscale dot arrays have an enhanced coercivity of around 200 Oe compared with that of the continuous thin film of 50 Oe. In combining with micromagnetic calculations, we found that the magnetization process follows two steps, the rotation of the top corner and then a switching of the bottom base, which controls the coercivity of the dots.
Keywords :
Kerr magneto-optical effect; coercive force; ferromagnetic materials; iron alloys; magnetic switching; micromagnetics; nanolithography; nanostructured materials; nickel alloys; self-assembly; silicon; Fe64Ni36-Si; Si; coercivity; in-plane focused magneto-optical Kerr effect; magnetic switching; magnetization; micromagnetic calculations; nanosphere lithography technique; self-assembly nanoscale dot arrays; silicon substrate; size 30 nm; Dot arrays; enhanced coercivity; local shape anisotropy; nanosphere lithography; self-assembly;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2008.2001333