DocumentCode :
3561878
Title :
Design of highly absorption structure by flatted ITO patterned substrate for thin film a-Si solar cells
Author :
Han, H.V. ; Shih, H.S. ; Chen, Hung Chi ; Tsai, Y.L. ; Yu, P.C. ; Kuo, H.C.
Author_Institution :
Dept. of Photonic, Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear :
2012
Firstpage :
1
Lastpage :
2
Abstract :
The patterned substrate is a flatted structure which composed with two materials to enhance the absorption of a-Si solar cell. We optimized this structure by simulation method and find it has good omnidirectional antireflection effect.
Keywords :
amorphous semiconductors; antireflection coatings; elemental semiconductors; optical design techniques; semiconductor thin films; silicon; solar cells; ITO; Si; a-Si solar cells; flatted ITO patterned substrate; flatted structure; highly absorption structure; omnidirectional antireflection effect; simulation method; thin film; Absorption; Current density; Indium tin oxide; Optical device fabrication; Photovoltaic cells; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2012 Conference on
Print_ISBN :
978-1-4673-1839-6
Type :
conf
Filename :
6325562
Link To Document :
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