• DocumentCode
    3562032
  • Title

    Depletion mechanisms in STED-inspired lithography

  • Author

    Fischer, J. ; Wolf, T.J.A. ; Unterreiner, A.-N. ; Wegener, M.

  • Author_Institution
    Inst. fur Angewandte Phys., Karlsruhe Inst. of Technol. (KIT), Karlsruhe, Germany
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Direct laser writing optical lithography using light-induced depletion allows for fabricating structures beyond the diffraction limit. We investigate the depletion mechanisms of the photoinitiator DETC aiming at optimizing future photoresists.
  • Keywords
    laser materials processing; light diffraction; optical fabrication; photolithography; photoresists; stimulated emission; STED-inspired lithography; direct laser writing optical lithography; light-induced depletion; photoinitiator DETC; photoresists; Diffraction; Laser excitation; Lithography; Resists; Sensitivity; Stimulated emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2012 Conference on
  • Print_ISBN
    978-1-4673-1839-6
  • Type

    conf

  • Filename
    6325800
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3562032