Title :
Uniform patterned synthesis of vertically-aligned carbon nanotubes on low-stress micromechanical structures
Author :
Teh, W.H. ; Smith, C.G. ; Teo, K.B.K. ; Lacerda, R.G. ; Amaratunga, G.A.J. ; Milne, W.I. ; Castignolles, M. ; Loiseau, A.
Author_Institution :
Cavendish Lab., Cambridge Univ., UK
Abstract :
We report a simple methodology to enable the integration of high yield, uniform and preferential growth of vertically-aligned carbon nanotubes (VACNTs) on micromechanical and nanomechanical structures. This technique uses a combination of ´electron beam crosslinked´ polymethylmethacrylate (PMMA) surface nanomachining and direct current plasma enhanced chemical vapor deposition (dc-PECVD) of carbon nanotubes.
Keywords :
carbon nanotubes; micromechanical devices; nanotechnology; plasma CVD; polymers; C; PECVD; carbon nanotubes; low-stress micromechanical structures; nanomachining; nanomechanical structures; plasma enhanced chemical vapor deposition; polymethylmethacrylate surface; preferential growth; vertically-aligned carbon nanotubes; Atomic force microscopy; Carbon nanotubes; Chemical vapor deposition; Electron beams; Lithography; Micromechanical devices; Nanoelectromechanical systems; Plasma applications; Plasma chemistry; Plasma properties;
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Print_ISBN :
0-7803-7731-1
DOI :
10.1109/SENSOR.2003.1215285
